CURRICULUM VITAE
First name: Ileana Viorica
Surname : Cernica
Date and place of birth:Bucharest, January 04 1958
Education:
Ph.D, University "POLITEHNICA" Bucharest, Major: Electronic and Telecommunication Engineering,Minor: Microelectronics
Dissertation title: New Technological Solutions in CMOS Integrated Circuits, 1998.
Professional experience :
Research/development and technology transfer in CMOS technologies and Microsystems technologies
Development of individual processes and technology design
Sensors/detectors - radiation, PIN, Hamamatsu type, biochemical on silicon substrate fabrication
Technological compatibility for microsiystems technologies
Advanced MCM technologies,
Processing and defect expertise for CMOS I.C. (development of QC techniques for I.C. dices, defect engineering and defect expertise, damage analysis and subsequent development/optimization of individual technological processes for yield improvement)
Research in ion implantation and annealing processes (BF2, As on Si, Ge substrates) and thin ultraclean silicon dioxides (growing regimes in order to adapt their characteristics to the applications - MOS gate type dioxides, microsystems applications).
Career:
09/03/1981 09/15/1983 I.I.R.U.C. ( Computer Service Company ), Bucharest
09/03/1981 - March 1983 - Maintenance engineer
March 1982- 09/15/1983 - Innovative Group Head09/15/1983 04/13/1993 Microelectronica, Bucharest, MOS I.C.Wafer Fab.Division
09/15/1983 12/01/1984 Process engineer (gate oxidation, ion implantation, chemical cleaning, thermal annealing aspects for I.C. MOS technologies)
12/01/1984 March 1987 Senior process integration engineer for CMOS technology (supervise the CMOS I.C. fabrication : processes control, processes development, processes innovative, Q.C.)
March 1987 08/01/1989 Technologies development engineer (implementation of CMOS Si-gate technology, technological experiments for microstrip silicon nuclear radiation detectors)
08/01/1989 07/01/1991 Diffusion / Oxidation Div. Head
07/01/1991 04/13/1993 Principal process integration engineer for CMOS technologies
Auxiliary: Q.C.engineer (visual control and fail expertise for I.C. MOS and for exported CMOS dices)
04/13/1993 05/25/1999 National R&D Institute for Microtechnology, Bucharest
04/13/1993 10/01/1994 Principal process integration engineer for CMOS technologies
10/01/1994 05/25/1999 R&D Laboratory Head
Technological Transfer Lab. Head (February 1997 05/25/1999)
Prototype & Technological Development Lab. Head (1995-1997)
(and associate head for Microfabrication Dept. 1994-1997)
Thermic Processes Lab. Head (1994 - 1995)01/01/1995 Senior R&D Engineer II level
project management.
05/25/1999 02/10/2000 Microelectronica S.A. Bucharest (member of experts group (4 persons) working on request)
Senior R&D engineer II level (05/25/1999 02/10/2000)
engineering management for CMOS I.C.
Q.A. Manager (working on ISO 9000 accreditation)( 05/25/1999 02/10/2000)
Microelectronica project manager for NATO for Peace No 974054 project (July 1999- February 2000)
Microelectronica project manager for a national R&D project - ORIZONT 2000 Programme (September 1999- February 2000)
02/10/2000 ...to present National R&D Institute for Microtechnology, Bucharest
06/01/2002 Director of Technological Development Department
Technological Transfer Lab. Head
Senior R&D engineer II level
Microtechnologies process development engineer (ion implantation, gate oxidation in MOS technologies, chemical cleaning, annealing, QC for CMOS technology, failure analysis and defects expertise)
Technological compatibility in microsystems technologies engineer
R&D Project management
Stages abroad: 1995 UETP - MEMS, Community programme for Education and Training in Technology (COMETT) Quality in Packaging , Neumunster, Germany
Present position:
Director of Technological Development Department
Technological Transfer Centre Head |
Senior R&D engineer II level
Research interests:
research/development and technology transfer for microsystems technologies
development of individual processes and technology design in micro and nanotechnologies
sensors/detectors - radiation, PIN, Hamamatsu type, biochemical on silicon substrate fabrication
technological compatibility for microsiystems technologies
advanced MCM technologies
development of defect analysis and QA techniques for microstructures and Microsystems
research in ion implantation and annealing processes , laser processes, interfaces control and thin ultraclean silicon dioxides
Past and current projects
(the most representative examples, indicating title/subject, source of founding, time
interval, main results obtained/expected, role played in the project):
Project manager for high speed photodetectors (1994-1996)
Project manager for Hammamatsu type photodetector (1996-1999)
Project manager for optimization CMOS technologies(1993-1999)
Microelectronica project manager for NATO for Peace No 974054 project (July 1999- February 2000)
Microelectronica project manager for a national R&D project - ORIZONT 2000 Programme (September 1999- February 2000)
Project manager for photodiodes micromatrix for optical fiber communications (project won at the National R&D Programs Contest RELANSIN 2000 September 2000- April 2003)
Project manager for "Comparative analysis of BF2 and B ion beam interactions with monocrystaline Ge and Si substrates. Applications in MOEMS" project (GRANT won at the National contest for GRANTS financial supported by The National Agency for Science Technology and Innovation December 2000 December 2002)
Project manager for " a and b g integrated on silicon sensors for environmental natural contamination (project won at the National R&D Programs Contest MATNANTECH October 2001- December 2004)
Project manager for for IMT as a partner in ROMES project " Microelectronics apllications for Laser ablation technologies" (project won at the National R&D Programs Contest MATNANTECH October 2001- October 2003)
Project manager for " Advanced MCM Technologies for RF Applications" (project won at the National R&D Programs Contest MATNANTECH November 2002- February 2005)
Project second manager for " Microstructures Matrix as Biological Cells support in tests, investigation and diagnosis applications" (project won at the National R&D Programs Contest MATNANTECH September 2002- April 2004)
Project second manager for "Strategy and implementation plans: new ways for reform the traditional microelectronics industry in the era of new economy based on knowledge"( (project won at the National R&D Programs Contest RELANSIN strategic programs September 2002- February 2004)
Main scientific publications:
PATENTS
Manufacturing technology for CMOS Integrated Circuits (Patent, 28.01.2000)
A Multiimplant Tuning Diode Technology (Patent, 1983)
Photoreader(Innovation,1983)
Phases generator for CE126 B (Innovation,1983)
Optimized manufacturing technique for MSI CMOS Integrated Circuits (Patent 2001)
Short Cycle Manufacturing Technology for Gate Arrays CMOS Integrated (Patent 2001)
PUBLICATIONS
R.Marinescu, A.Silard, I.Cernica "A Simple Model for Dry Oxidation of Silicon Ion Implanted with High Doses of Arsenic", Journal of Materials Science Letters, 11(1992),p.756
R.Leancu, M.Avram, I.Cernica "Particle and Chemical Contamination of Si Wafers During Chemical Cleaning" International Conference for Semiconductors (IEEE co-sponsored), Sinaia, CAS 1992
I.Cernica, Gh.Cimpoca "A Study of Leakage current Minimization for Silicon Sensors", MRS Conference, April 1993, San Francisco California, USA
Gh.Cimpoca, I.Cernica, M. Lazarovici "Proposal for Double- Sided Silicon Microstrip Detector, IISSC, May 1993, San Francisco, California, USA
I.Cernica, O.Buiu, "Optical Characterization of Thin SiO2 Films Grown in HCl Atmosphere" MRS Spring Meeting, April 1994, USA
I.Cernica,B.Stefanescu, O.Buiu, D.Dascalu "A 2D Model For Thermal SiO2 Thin Films Grown in H2+O2+HCl Atmosphere", NASECODE XII, June 1994, Dublin , Ireland
I.Vieru, I.Cernica, L.Kuliuk, O.Buiu "Radiation Deffects in Thin Thermal Silicon Dioxide Films, EURODIN X, August 1994, Lyon, France
I.Kravetki....O.Buiu, I.Cernica "Reflected Optical Second Harmonic Generation for Characterization of Ion Implanted, Thermal Annealed Silicon Surfaces and Silicon-Insulator Interfaces", X International Conference on Ion Implantation Technology, June 1994, Catania, Italy
I.Kravetki, L.Kuliuc, I.Cernica, O.Buiu "In Situ Control of The Thermal Induced Processes at the Insulator/Si Interfaces by Reflected Optical SHG Method, ECASIA95 , October 1995, Montreux, France
I.Cernica, I.Vieru, L.Kuliuk, A.Micu "Reflected optical SHG Study of Thermal and Laser Annealing on BF2 Ion Implanted Silicon", E-MRS 1996 Spring Meeting, June 1996, Strassbourg, France
I.Cernica, C.Dunare, L. Bocioaca, O. Buiu, "Polysislicon Gate Dry Etching process Optimization in CMOS Technologies", 20th International Semiconductor Conference - CAS'97(IEEE co-sponsored), Sinaia, Romania, 1997
R.Vasilco, L.Hinescu, I.Cernica, C.Tabarasanu "Organometallic Phthalocyanine Derivatives as Sensing Element in a Metal Oxide Semiconductor (MOS) based ISFET", Word Congr. Med. Phys. & Biomed. Eng.,September 1997, Nice, France
C.Dunare, I.Cernica a.s.o " Plasma Etching Optimization for Thin Film Patterning in Micromachining", First Swiss- Romanian Workshop on Microfluidics, Lausanne,August 1998, Switzerland
C.Dunare, I.Cernica a.s.o " Polysilicon Plasma Etching for Micromachining", First Swiss- Romanian Workshop on Microfluidics, Lausanne, August 1998, Switzerland
C.Flueraru,M.Gartner, I.Cernica, R.Radoi, O.Buiu "Spectroellipsometric Investigation of Optical Properties of SiO2 grown by Wet Thermal Oxidation", IV C, 14th International Vacuum Congress (IVC14)/NANO 5/QSA - 10, Birmingham, September 1998, UK
I.Cernica, C. Dunare, L.Bocioaca, "Some Particulary Aspects of Polysilicon Gate Plasma Etching Process in CMOS Technologies", Conference E-MRS Spring Meeting Conference, Strasbourg, France, 1998
I.Cernica,C. Dunare, a.s.o."Conformity Optimization for Metal Interconections in MOS Technologies", International Semiconductor Conference (CAS '98)(IEEE co-sponsored), Sinaia, Romania, 1998
R.Divan, I.Cernica, N.Moldovan, E.Manea "Ion Implantation Induced Etch Stop in Germanium", XIIth International Conference on Ion Implantation Technology, June 1998, Kyoto, Japan
E. Manea, I.Cernica, R.Divan "Some particularity aspects of residual stress in thick membranes obtained by boron diffusion processes" MRS Fall Meeting, Boston, 1998,USAE.Manea, C.Gangu, I.Cernica, Fl.Craciunoiu, R.Divan "Optimized polysilicon CMOS technology for gate array applications" International Conference for Semiconductors (IEEE co-sponsored), Sinaia, CAS 1998, Romania
D.Cristea, I. Cernica , C.Dunare., R.Muller, "Hybridisation of LED's with silicon microsensors", Proc. EMRS99 Spring Meeting, Symposium K, Strasbourg, France, June 1999 Published by European Material Research Society.
E.Manea, R.Divan, I.Cernica "Evidence of Dislocations for the Control of the Roughness of Highly Thermal Boron- Doped Diffused Silicon Layers", SPIE Micromachining and Microfabrication Symposium, 1999, Santa Clara, USA
R.Chiurtu, M.Stanescu, I.Cernica, R.Vasilco, "Urea Biosensor Based on a Capacitive MOS Device", Southern Biomed. Eng. Conf.& 2 Int. Conf. Ethical Issues Biomed. Eng., Clemson University,S.C., 1999, USA
I.Cernica, E.Manea a.s.o., "Surface Recrystalization Characterization Method for Annealed BF2 Ion Implantad Silicon", EMRS'99 Conference, Strassbourg, 1999, France
R.Divan, I.Cernica, E.Manea "Etch-Stop in Germanium induced by Ion Implantation for Bulk Micromachining Applications in IR Domain" SPIE Proceedings, vol.3874, p.403-411, Santa Clara 20-22 September 1999
E.Manea, R.Divan, I.Cernica "Evidence of Dislocations for The Control of Roughness of Highly Thermal Boron-Doped Diffused Silicon Layers" SPIE Proceedings, vol.3874, p.395-402, Santa Clara 20-22 September 1999
Dana Cristea, F.Craciunoiu, M.Modreanu, M.Caldararu, I.Cernica " Photonic circuits integrated with CMOS compatible photodetectors", Proc. of E-MRS Spring Meeting, Strasbourg, Franta, June 2000
I. Cernica, E. Manea, C. Dunare Analysis of the Migration of the Defects Induced by High-Dose Ion Implantation of Arsenic in Silicon, 23-th Edition of International Semiconductor Conference, (IEEE co-sponsored), CAS Proceedings, vol.1,p.267-270, Sinaia, October 10-14, 2000.
E. Manea, I. Cernica, V. Dolocan, R. M�ller "Residual Stress Analysis in Thin Membranes Obtained by Boron Diffusion Processes", 23-th Edition of International Semiconductor Conference, (IEEE co-sponsored), CAS Proceedings, vol.2,p.471-474, Sinaia, October 10-14, 2000
C. Dunare, I. Cernica, D. Popescu, D. Cristea, M. Modreanu, E. Manea "SOI Materials for MOEMS Obtained by Silicon Direct Bonding Technique", 23-th Edition of International Semiconductor Conference, (IEEE co-sponsored), CAS Proceedings, vol.2,p.531-534, Sinaia, October 10-14, 2000
Gh.V.Cimpoca, I.Cernica, O.Bute, "Radiation damage effects on X-ray silicon detectors", The 3-rd International Balkan Workshop on Applied Physics, June-2002, T�rgoviste, Romania
I.Cernica, E.Manea, A.Popescu, "A method for electrical yield improvement for high speed polysilicon CMOS processed wafers", 25-th Edition of International Semiconductor Conference, (IEEE co-sponsored), CAS Proceedings, Sinaia, October 7-12, 2002
Member of professional associations:
IEEE member (from 1992-2000) member no.03194958
Member in first NEXUSEAST MST Workshop organization committee (08/11/1995-08/14/1995, Sinaia, Romania)
Member in Scientific Board of National R&D Institute for Microtechnology (from 1998 to 2001)
Member of Executive Board of IMT from May 2002
Additional information (expertise, prizes, etc.):
ACADEMIC EXPERIENCE
08/01/1985..to present Associated professor at the "POLITEHNICA" University, Bucharest
Faculty of Electronics & Telecommunications, Department of Technology and Reliability (courses:Electronic materials and Electronic Technology)
From 2001 . Disertation scientific co-ordinator for Mecatronics and Mechanic and Optic specialties in Faculty of Mechanics "Politehnica" University, Bucharest
08/01/1995- 06/15/1996 Associated professor at the "POLITEHNICA" University, Bucharest
Faculty of Mechanics (course: Microsystems Technologies for M.S. in mechatronics)
05/16/1996 05/20/1996
Invited Speaker at The 2 NEXUSEAST Workshop on MST, Szczyrk, Poland
Invited lecture: MST in Romania - The State of Art
June 1998
Invited Speaker at Spanish - Romanian Summer School (organized by Romanian Academy, "Politehnica" University, Bucharest, Complutense University, Madrid, IMT Bucharest) "Defects in Materials"
Invited lecture: Interconnection Failure Mechanisms in Hybrid Integrated Microsystems
July 2002
Invited speaker at Summer school "Thin Films for Bioactive and Biocompatible Materials" (organized by IMT and University of Bucharest)
Invited lecture: Compatible Microelectronics Technologies for Biomedical Applications
POSTUNIVERSITARY COURSES:
Time |
Institute |
Course |
1991 | Romanian Ministry of Industries | Training in management |
1994 | "POLITEHNICA" University, Bucharest (Chemistry Engineering Faculty) | Analitical Methods for Characterization of Surfaces , Interfaces and Thin Films |
1995 | UETP - MEMS, Community programme for Education and Training in Technology (COMETT) Neumunster, Germany | Quality in Packaging |
2001 | AMCSIT, Bucharest | C&D Project Manager Course |
December 2002/may 2003 | Academy of Economic Studies , Bucharest | Management and
international economic co-operation (student up till now) |
PRIZES and DISTINCTIONS
1981 Ist prize at "Politehnica" University Student Contest Chapter Electronics Engineering (paper "Experiments of Ion Implantation Technique in Manufacturing n+pp+ Silicon Structures")
1985 Ist prize at National Semiconductor Conference Chapter Technology (paper Some Aspects Regarding the Etch of PSG Silicon Oxides")
2000 Diploma and medal of Distinction in Romanian Research (given by Romanian National Agency for Science, Technology and Innovation)
Foreign languages:
English (very good, oral, written)
French (satisfying for understanding and reading)
Contact information:
E-mail: [email protected]. Address: Erou Iancu Nicolae,nr. 32B, 72996 Bucharest
Tel. +40-12-490.84.12, +40-12-490.82.03, +40-12-490.85.84. Fax.+40-12-490.84.12, +40-12-490.46.61