CURRICULUM VITAE 

  First name: ELENA

  Surname : MANEA

  Date and place of birth: august 21, 1954, Arad

  Education:

  1978, M.Sc." University of Bucharest , Faculty of Physics",
  1998, Ph.D. in "Solid State Physics Thesis" "University of Bucharest , Faculty of Physics",

  Professional experience:

   20 years experience in silicon planar technology including:

  photolithography and diffusion processes for MOS-CI, thin film deposition (e-beam and sputtering) for wafer up 4".
  elaboration of processes and vehicles for testing the performances of the photolithography and diffusion processes
  optimized of technological process to obtain new devices: for CMOS Al gate IC, polysilicon CMOS for gate array,
thin films silicon solar cells,
  anizotropic etching of crystalline silicon in alcaline solutions
  define the thickness of the silicon membrane by boron diffusion processes for MOMS,

  Career:

  1978 -1983: Institute of Research for Electronic Components (ICCE) for Microelectronica, Bucharest, MOS I.C. Wafer Fabrication Division,
Process engineer (chemical cleaning, thermal and photolithography process for I.C. MOS technologies)
  1983 -1993 : Microelectronica, Bucharest, MOS I.C. Wafer Fabrication Division, Head of MOS I.C. Wafer Fabrication Division
  1993 -1999:National R&D Institute for Microtechnology, Bucharest, MOS I.C. Wafer Fabrication Division, senior scientific researcher and process integration engineer for CMOS technologies and then Head of Wafer Fabrication Laboratory
  1999 -2000: Microelectronica SA, Bucharest, MOS I.C. Wafer Fabrication Division, Ph.D, senior scientific researcher Head of MOS I.C. Wafer Fabrication Division
  2000 – to present: National R&D Institute for Microtechnology, Bucharest, Wafer Fabrication Laboratory, Ph.D, senior scientific researcher, Head of Wafer Fabrication Laboratory

  Stages abroad:

  England, Fell, 1984
  "Politehnica" University, Bucharest (Chemistry Engineering Faculty) cours, Analytical Methods of Thin Films, Surfaces and Interfaces Characterisation, 1994 -1995

  Present position: Ph.D, senior scientific researcher

  Research interests:

  Technological engineering for microsystems and microsensors technologies
  Research new materiale and processes for microstructured glass for biomedical application

  Past and current projects:

  2002 – 2004: Romanian National R&D Program MATNANTECH ‘’Matricial networks of alveoles, supporting cells for investigation, testing and diagnosis"; source of founding: budget; project manager

  collaborator to:

  2000-2003: Romanian National R&D Program RELANSIN 2000 "Photodiodes micromatrix for optical fiber communications"
source of founding: budget and co-financing
  2000-2003: Romanian National R&D Program RELANSIN "Technology Glucose sensor an amperometric",
source of founding: budget and co-financing
  2001-2004 : Romanian National R&D Program MATNANTECH " a and � integrated on silicon sensors for environmental natural contamination" source of founding: budget and co-financing
  2001-2003: Romanian National R&D Program MATNANTECH " Microelectronics applications for Laser ablation technologies"
source of founding: budget and co-financing
  2002-2004: Romanian National R&D Program MATNANTECH" Advanced MCM technologies for RF applications"
source of founding: budget and co-financing

  Main scientific publications:

  Scientific Papers in journals:`

  "Optical improved structure of polycrystalline silicon-based thin-film solar cell", Elena Budianu, Munizer Purica, Elena Manea, Emil Rusu, Raluca Gavrila, Mihai Danila, Solar Energy Materials & Solar Cells, Vol. 72, 2002, pp 223-229
  "Experiments for microphotonic components fabrication using Si <1 1 1> eching techniques", Dana Cristea, Munizer Purica, Elena Manea, Viorel Avramescu, Sensor & Actuators A, Vol. 99, 2002, pp. 92-97
  "Experiments for Inorganic-Organic Hybrid sol-gel films for micro- and nano-photonics, A. Jitaru, M. Gartner, M. Zaharescu, D. Cristea, Elena Manea, to be published in Materials Science

  Scientific Papers in Conferences Proccedings:

  "Analysis of the Migration of the Defects Induced by High-Dose Ion Implantation of Arsenic in Silicon", I. Cernica, E. Manea, C. Dunare, 23-th Edition of International Semiconductor Conference, Sinaia, oct. 10-14, Proseedings 2000, pp.267-271.
  "Residual Stress Analysis in Thin Membranes Obtained by Boron Diffusion Processes", E. Manea, I. Cernica, V. Dolocan, R. M�ller, 23-th Edition of International Semiconductor Conference, Sinaia, oct. 10-14, Proseedings 2000, pp. 471-475
  "SOI Materials for MOEMS Obtained by Silicon Direct Bonding Technique", C. Dunare, I. Cernica, D. Popescu, D. Cristea, M. Modreanu, E. Manea, 23-th Edition of International Semiconductor Conference, Sinaia, oct. 10-14, Proseedings 2000, pp 531-535
  "Experiments for Microphotonic Components Fabrication using Si<111> Etching Techniques", D. Cristea, P. Obreja, M. Purica, E. Manea, V. Avramescu, THE European Material Conference E-MRS 2001 Spring Meeting, Strasbourg (France), June 5-8, 2001, Book of Abstracts p.J-9, J/P08
  "Silicon Membranes as Sensing Elements For MOEMS Applications: Fabrication/ Characterization", R. Muller, E. Manea, P. Obreja, THE European Material Conference E-MRS 2001 Spring Meeting, Strasbourg (France), June 5-8, 2001, Book of Abstracts p. J-10, J/P11
  "Optical Improved Structure of Polycristalline Silicon Based Thin Film Solar Cell", E. Budianu, M. Purica, E. Manea, THE European Material Conference E-MRS 2001 Spring Meeting, Strasbourg (France), June 5-8, 2001, Book of Abstracts, p.E-4, E/P-A7
  "Desing and Optimization of a MSM Photodetector based on Poly-Si Layer", E. Budianu, M. Purica, E. Manea, M. Danila, R. Gavrila, I. Oprea, 24-th Edition of International Semiconductor Conference, Sinaia, oct. 9-13, Proseedings 2001, pp. 181-184
  "Thin Membranes obtained by Surface Micromachining- Preliminary Study for a Fabry-Perot Interferometer", R. Muller, E. Manea, M. Kusko, 24-th Edition of International Semiconductor Conference, Sinaia, oct. 9-13, Proseedings 2001, pp. 193-196
  "Etching Processes of Si <111> Wafers for Fabrication of Microphotonic Components", D. Cristea, M. Purica, E. Manea, P. Obreja, 24-th Edition of International Semiconductor Conference, Sinaia, oct. 9-13, Proseedings 2001, pp. 197- 200
  "New Bulk Micromachining Technique for Silicon Membrane Fabricotion in MOEMS Applications", E. Manea, I. Cenica, R. Muller, ARMY p. 29 - 34
  "New Silicon Waveguides fabrication process based on the anisotropic etching of Si <111> - oriented wafers", D. Cristea, P. Obreja, E. Manea, E-MRS Spring Meeting 2002, Strasbourg, France, June 2002,
  "Sol-gel thin films for integrated optics and optical gas sensors on silicon" , M. Crisan, M. Gartner, D. Cristea, M. Zaharescu, E. Manea, E-MRS Spring Meeting 2002, Strasbourg, France, June 2002,
  "Experiments for inorganic–organig hybrid sol–gel based photonic components", A. Jitaru, M. Gartner, M. Zaharescu, D. Cristea, E. Manea, E-MRS Spring Meeting 2002, Strasbourg, France, June 2002,
  "Sacrificial and structural layers used in surface micromachined Fabry-Perot", R. Muller, D. Syridis, E. Manea, M. Kusko, D. Apostol, V. Damian, E-MRS Spring Meeting 2002, Strasbourg, France, June 2002,
  "New technique for Si-based microphotonic components fabrication",D. Cristea, E. Manea, ICO19-Optics for the Quality of Life, 25-30 August, Florence, Italy, pp. 647 - 648
  "Structural Investigation of LPCVD Polly-Silicon Layers used in Surface Micromachining", M. Danila, E. Manea, R. Muller, R. Gavrila, 25-th Edition of International Semiconductor Conference, Sinaia, oct. 8-12, Proseedings 2002, pp. 91 - 94
  "Mixed Valence Compounds for Integrated Optics", M. Bulinski, V. Kuncser, C. Plapcianu, D. Cristea, E. Manea, P. Obreja, S. Krautwald, H. Franke, F.E. Wagner, G. Filoti, 25-th Edition of International Semiconductor Conference, Sinaia, oct. 8-12, Proseedings 2002, pp.203 - 206
  " Blue /Ultraviolet Sensitive Detector on <100> Silicon Membrane",M. Purica, E. Budianu, E. Manea, 25-th Edition of International Semiconductor Conference, Sinaia, oct. 8-12, Proseedings 2002, pp.211 - 214
  " Polysilicon Thin Layers for Photovoltaic Applications", E. Budianu, M. Purica, E. Rusu, E. Manea, R. Gavrila, 25-th Edition of International Semiconductor Conference, Sinaia, oct. 8-12, Proseedings 2002, pp.215 - 218
  "Spectroscopic Ellipsometry Characterisation of Solid Phase Crystallisation of Silicon Thin Films obtained by LPCVD", M. Modreanu, M. Gartner, C. Cobianu, E. Manea, 25-th Edition of International Semiconductor Conference, Sinaia, oct. 8-12, Proseedings 2002, pp.287 - 290
  "A Method for Electrical Yied Improvement for High Speed Polysilicon CMOS Processed Wafers", I. Cernica, E. Manea, A. Popescu, 25-th Edition of International Semiconductor Conference, Sinaia, oct. 8-12, Proseedings 2002, pp.339 – 342
  "Poly-Si thin layers for high speed photodetectors", E. Budianu, M. Purica, E. Manea, M. Danila, R. Gavrila, Proseedings of the International Symposium on Electron Devices for Microwave and Optoelectronic Applications EDMO 2002, Manchester, Nov.2002, pp.202 -204
  "Sol-gel preparation of thin films for integrated optics", M. Crisan, M. Gartner, D. Cristea, M. Zaharescu, L.Predoana, E. Manea, M. Caldararu, Proseedings of the International Symposium on Electron Devices for Microwave and Optoelectronic Applications EDMO 2002, Manchester,
Nov.2002, pp.205 -210
  "Si-based microphotonic components fabrication using anisotropic etching of <111>-oriented silicon wafers", D. Cristea, E. Manea, The International Conference of Advanced Topics in Optoelectronics Micro & Nanotechnologies (ATOM 2002), Bucharest, Nov. 21-23, Conference Abstracts 2002, p.32
  "Integrated Fabry-Perot microcavity based on surface micromachining processes", R. Muller, D. Syvridis, M. Kusko, D. Cristea, D. Apostol, V. Damian, M. Bercu, E. Manea, The International Conference of Advanced Topics in Optoelectronics Micro & Nanotechnologies (ATOM 2002), Bucharest, Nov. 21-23, Conference Abstracts 2002, p.40

  Patents:

  Manufacturing Technology for CMOS Integrated Circuits (Nr. patent:115392 B1/ 28.01.2000)
  Optimized Manufacturing Technique for MIS CMOS Integrated Circuits (Nr. patent:116691 / 28.12.2001)
  Short Cycle Manufacturing Technology for Gate Arrays CMOS Integrated (Nr. patent:116692 / 28.12.2001)

  Member of professional associations: IEEE Electron Device Society (1996- 2000)

  Additional information:

  2000- Diploma and medal of Distinction in Romanian Research ( given by Romanian National Agency for Science, Technology and Innovation)
  2002- Prize at National Semiconductor Conference, paper "Desing and Optimization of a MSM Photodetector based on Poly-Si Layer", E. Budianu, M. Purica, E. Manea, M. Danila, R. Gavrila, I. Oprea

  Foreign languages: english, french

  Contact information:

  [email protected]
  Phone:+ 40-1-4908412 / 36, fax: +40-1-4908238