Dr. Mircea V. Dusa
Dr. Mircea V. Dusa is an IMEC Fellow currently working in the field of sub-10nm patterning. Mircea has an uninterrupted, forty years career in semiconductor industry covering various areas of lithography: exposure tools, mask making, metrology, process control and co-optimization of design with patterning processes. He received a MS in Electrical Engineering and Solid State Physics and a doctorate in Applied Optics from Polytechnic University of Bucharest.
Before joining IMEC, he spent 20 years with ASML, the world leading supplier of lithography equipment, as an ASML Fellow, conducting exploratory activities to enhance performance of immersion and EUV exposure tools as holistic systems.
Prior to ASML, he held engineering positions in R&D and manufacturing at Fairchild Research Center of National Semiconductor, Zygo Corporation, SEEQ Technology, ICCE Bucuresti. He authored over 200 technical publications and holds two dozen US patents in lithography and metrology sciences on topics ranging from imaging, overlay, metrology and control. During his career he pioneered development and introduction into manufacturing of enabling technologies for node to node scaling like multi-patterning and spectroscopic scatterometry metrology. He is a SPIE and IEEE member and a SPIE Fellow. Dr. Dusa chaired SPIE's Advanced Lithography Symposium and Optical Microlithography Conferences and is teaching SPIE's special course on Multi Patterning Principles and Applications.