Technical characteristics:

Ultra high resolution electron beam lithography and nano engineering workstation Raith e_Line is a versatile electron beam lithography system having complied with the specific requirements of interdisciplinary research.
Selected options for nanomanipu-lation, EBID and EBIE expand this system to a nano-engineering workstation.
The state-of-the-art e_LiNE electron column matches perfectly with a number of key applications in: nanoelectroniccs, photonic crystals (PCs),  Difractve Optic Elements (DOE),  CNTs  interconections, nanodevices and nanosystems for fundamental research and bio applications.

Basic hardware features:

• Thermal assisted field emission gun;
• Cross-over free column with highest beam current density at 2 nm spot size;
• Laser interferometer stage with 100 mm by 100 mm travel range and 2 nm resolution achieved by closed-loop piezo-positioning;
• 10 MHZ DSP-controlled digital pattern generator;
• Optional gas injection system, nanomanipulators, EDX, optical microscope, loadlock, rotation and tilt module, FBMS mode exposure;
• Minimum line width < 20 nm;  Stitching accuracy 40 nm;  Overlay accuracy 40 nm;

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Nano engineering options:

• Gas injector unit with up to five capillaries;
• Nano prober arrangement with up to four needles;
• Retractable x-ray analysis unit;
• Optical microscope;
• Height sensor;
• Load lock;
• Rotation tilt module for SEM inspection;

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Applications:

• Nano lithography with sub 20 nm resolution;
•  High speed devices e.g. HEMT;
• CMOS process and device developments;
• Resist less lithography;
• E-beam induced deposition and etching;
• Imprint template fabrication;
• Nano probing and electrical measurements;
• Nano and pattern placement metrology;

• Fabrication of photonic crystals;

Photonic cristalsin PMMA on silicon for near IR application

• Gratings, DFB lasers, SAW devices;

SAW device for microwave applications obtained using mix and match
lithography (EBL and optical lithography)

• Three-dimensional structures;

Diffractive Optical Element (DOE) for photonics applications

• Optical devices, holograms, micro lenses;

High aspect ratio (12:1) structures in PMMA applications in nanotechnology.
Left: crosslines; Rigth nanopilars.

• High resolution SEM inspection;

High resolution CNTs imaging.

Partneship:

Application scientist: Phys. Adrian Dinescu, [email protected]

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Last update: March 05, 2012