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CURRICULUM VITAE   

First name: Niculae
Surname: Dumbravescu
Date and place of birth: June 04, 1953, Bucharest

Education: MS (5 years) in electronics, Polytechnica Institute from Bucharest, Faculty of Electronics and Telecomunications, 1977.

Professional experience:
   1. Non-conventional microstructuring techniques such as:
-High Aspect Ratio Microstructuring (HARM) of thick resists by LiGA (S-LiGA, Hot embossing) and LiGA based techniques (E-Beam LiGA, Laser-LiGA, EDM-LiGA, Gray-tone-LiGA);
-3-D structuring of thick resists by gray-tone lithography (including an original novel proposal: “3-D high resolution”);
   2. Standard (Cr on glass) / special (metallic stencils, photoplot type, Cr. on PC and 3-D, high resolution, deep X-ray absorber) masks fabrication.
   3. Failure analysis (more than one year at ROOD Technology Deutschland + Co)
   4. Design of high resolution cantilever-type, piezoresistive accelerometer

Career:
   1. 1977-1981: ICCE (Research and Development Center in Electronic Components);
   2. 1981-1983: IFA (Atomic Physics Institute);
   3. 1983-1994: ICCE (Research and Development Center in Electronic Components);
   4. 1994-2000: IMT (Institute for Microtechnologies);
   5. 2000-2001: ROOD Technology, Noerdlinger, Germany;
   6. 2002-present: INCD for Microtechnologies.

Stages abroad:
 

Present position: III rank stientific researcher

Research interests: EB Lithography, Direct Laser Writing for mask fabrication, hot embossing in thermoplastic polymers, PDMS procesing for microoptics and microfluidic devices.

Past and current projects:
   TOXICHIP, international project (2005-2009)
   Technologies for fabrication of nano-objects applying up-down method, (2005)
   MITRAC, Matnantech project (2003)
   Capilar Electrophoresis device, internal funding project (2003)

Recent scientific publications:
   1 N. Dumbravescu, “Improvements in photoplot-based reticle Fabrication” Annual Semiconductor Conference, Proc. CAS’03, pp.171-174, Sinaia, 2003.
   2 N. Dumbravescu, A.Enescu, “Enhancements in Design and Technology applied to a high sensitivity piezoresistive Accelerometer”, Annual Semiconductor Conference, Proc. CAS’03, pp.205-208, Sinaia, 2003.
   3 N. Dumbravescu, A.Enescu, “Solutions applied to increase Sensitivity of a cantilever-type Micro-accelerometer”, Micro Mechanics Europe Workshop, Proc. MME’03, pp.227-230, Delft, 2003.
   4 N. Dumbravescu, A.Enescu, “Design Optimisation applied to a cantilever-type piezoresistive Accelerometer” International Forum on MicroNano Integration, Book of MINIT’03, pp.289-291, Potsdam, 2003.
   5 N. Dumbravescu, A.Enescu, “Original Technology applied for Manufacturing a cantilever type Micro-accelerometer”, MM&MF, Proc. SPIE, Vol.5342, pp. 260-268, San Jose, 2004.
   6 N. Dumbravescu, S. Nedelcu, “Photoplot-based reticle design using dots approach”, MicroMechanics Europe Workshop, Proc. MME’04, pp.135-138, Leuven, 2004.
   7 N. Dumbravescu, S. Nedelcu, E. Dascalu, F. Babarada, “Optimization of photoplot-based Mask Fabrication”, Annual Semiconductor Conference, Proc. CAS’04, pp. 245-248, Sinaia, 2004.
   8 D. Apostol, V. Damian, M. Kusko, N. Dumbravescu, R. Muller, C. Podaru, D. Cojoc, S. N. Toma, “On a diffractive optical Element”, Annual Semiconductor Conference, Proc. CAS’04, pp.513-516, Sinaia, 2004.
   9 S. N. Toma, A. Alexandrescu, D. Cristea, R. Muller, M. Kusko, N. Dumbravescu, V. Nascov, D. Cojoc, “Binary Phase reflective diffractive optical Elements. Design and Fabrication”, Annual Semiconductor Conference, Proc. CAS’04, pp. 401-404, Sinaia, 2004..
   10 F. Babarada, E. Lakatos, M. D. Profirescu, C. Amza, E. Manea, N. Dumbravescu, O. Profirescu, “MOSFET Process Optimisation and characteristics Extraction”, Annual Semiconductor Conference, Proc. CAS’04, pp..319-322, Sinaia, 2004.
   11 B. Firtat C. Moldovan, N. Dumbravescu, S.Ionita, I. Bostan, “Design, Microfabrication and Testing of acceleration Microtransducers for automotiveApplications”, Annual Semiconductor Conference, Proc. CAS’04, pp..271-274, Sinaia, 2004.
   12 O. Profirescu, F. Babarada, M. D. Profirescu, C. Ravariu, E. Manea, N. Dumbravescu, C. Dunare, D. Ulieru, “MOSFET conductance Modelling including distortion analysis Aspects”, Annual Semiconductor Conference, Proc. CAS’05, pp. 439-442, Sinaia, 2005.
   13 I. Cernica, E. Manea, N. Dumbravescu, “New hybrid integration Technique for custom designed high speed optical Micromatrix”, Oral to Annual Semiconductor Conference, Proc. CAS’05, pp. 183-186, Sinaia, 2005
   14 Babarada Florin, Profirescu Marcel D., Ravariu Cristian, Profirescu Ovidiu, Manea Elena, N. Dumbravescu, Dunare Camelia , Ulieru Dumitru; MOSFET MODELLING INCLUDING SECOND ORDER EFFECTS; Applied Simulation and Modelling; 2006; pp.606-510
   15 F. Babarada, M. Profirescu, C. Ravariu, O. Profirescu, E. Manea, N. Dumbravescu, C. Dunare, D. Ulieru; Mosfet Modelling for Distortion Analysis; International Conference on Micro and Nanotehnologies; 2006; pp.123-126
   16 F. Babarada, M.D. Profirescu, C. Ravariu, O. Profirescu, E. Manea, N. Dumbravescu, C. Dunare, D. Ulieru; Microelectronics Interactive Distance Learning; International Conference Interactive Computer Aided Learning; 2006; pp.214-218

Member of professional associations:

Additional information:
   1 N. Dumbravescu, "Smooth 3-D Shaping of thick Resists by means of gray-tone Lithography", Best Poster Award at CAS ’ 99, Sinaia.
   2 N. Dumbravescu, S. Schiaua, "Possibilities to increase the Resolution of photoelectric incremental rotary Encoders", paper published in: Materials Science in Semiconductor Processing 3 (2000), pp. 557 – 561.
   3 N. Dumbravescu, "Experiments for 3-D Structuring of thick Resists by gray-tone Lithography", paper published in: Materials Science in Semiconductor Processing 3 (2000), pp. 569 - 573
   4 E. Manea, I. Cernica, N. Dumbravescu, “Microconcentrateurs pour cellules solaires basees sur la microstructuration de surface du substrat” Medaille d’or at EUREKA 2005, Brusseles.

Foreign languages: English, French and German

Contact information:
   E-mail: niculae.dumbravescu[at]imt.ro
   Tel: +40.21.490 84 12; +40.21.490 85 84; Fax: +40.21.490 82 38
   Classic mailing address: PO Box 38-160, 023573 Bucharest, Romania.
   Fast mailing address: National Institute for Reseach and Development in Microtechologies, 32B Erou Iancu Nicolae, 077190 Bucharest, Romania.