Electron Beam Lithography and Nanoengineering Workstation – Raith e_Line (RAITH GmbH, Germany)- versatile nanolithography system by direct patterning of electron resists, electron beam-assisted deposition and etching, with < 20 nm achievable resolution;

Ultra High resolution Field Emission Gun Scanning Electron Microscope (FEG-SEM) - Nova NanoSEM 630 (FEI Company, USA), equipped with EDX spectrometer (EDAX TEAM Multifunctional Near-field Scanning

Probe Microscope (SPM) - NTEGRA Aura (NT-MDT Co., Russia) -  for high resolution 3D imaging and complex characterization of the surfaces by advanced complementary techniques (AFM, STM, EFM, MFM, SKPM, C-AFM, etc.);

Nano Indenter G200 (KLA - former Agilent Technologies, USA) - used for high resolution characterization of the mechanical properties of small-volume samples.